Exhibition

Design By Distance

2 Jun 2020 – 31 Dec 2020

Regular hours

Tuesday
11:00 – 18:00
Wednesday
11:00 – 18:00
Thursday
11:00 – 18:00
Friday
11:00 – 18:00
Saturday
11:00 – 18:00
Sunday
12:00 – 17:00

Free admission

Museum of Craft and Design

San Francisco
California, United States

Travel Information

  • 48 Bus
  • KT Muni Line

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Design by Distance showcases how designers from around the world are responding to the COVID-19 pandemic through the development of objects, garments, accessories, and space planning.

About

Curated by Ginger Gregg Duggan and Judith Hoos Fox of c2-curatorsquared, Design by Distance highlights designers who are proposing new forms. These proposals, some meant for production, others speculative, offer commentary on the range of needs and emotions elicited by facing a pandemic. Humor and satire, albeit of a gallows sort, results in masks, emoji sets, and mechanisms for maintaining social distance, a term that has become part of a collective cultural zeitgeist nearly overnight.

Participating Designers:
Caret Studio, Italy; Chih Chiu, China; Andrea Ayala Closa, Spain; Paul Cocksedge, United Kingdom; Sun Dayong, China; Joe Doucet X Partners, United States/United Kingdom; Libero Rutilo and Ekaterina Shchetina, designlibero, Italy; Dutch Invertuals, Netherlands; Ying Gao, Canada/Switzerland; Christophe Gernigon, France; Ýr Jóhannsdóttir, Iceland; Livable/ Sep Verboom, Belgium; Umberto Menasci, Italy; multiply design, Hong Kong; Nendo, Chief Designer Oki Sato, Japan/Italy; Lucy+Jorge Orta, France; Plastique Fantastique, Germany; Max Siedentopf, Germany/Namibia/United Kingdom; Studio b Severin, Germany; Veronica Toppino, Italy/UK; &Walsh, United States; Kiran Zhu, China.

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